重掺杂衬底上轻掺杂硅外延层厚度的测试 红外反射法
Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates—Infrared reflectance method
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发布于：2025-10-31
实施于：2026-05-01
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Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates—Infrared reflectance method