硅外延用三氯氢硅中杂质含量的测定 电感耦合等离子体质谱法
Determination of impurity content in trichlorosilane for silicon epitaxy—Inductively coupled plasma mass spectrometry
标准状态
发布于:2025-10-31
实施于:2026-05-01
废止
Determination of impurity content in trichlorosilane for silicon epitaxy—Inductively coupled plasma mass spectrometry