表面化学分析 深度剖析 中能离子散射术对硅基底上纳米尺度重金属氧化物薄膜的无损深度剖析
Surface chemical analysis—Depth profiling—Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
标准状态
发布于:2026-01-28
实施于:2026-08-01
废止
Surface chemical analysis—Depth profiling—Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering