高深宽比微结构形貌参数显微干涉测量方法（英文版）
Measurement method for topographic parameters of high-aspect-ratio microstructures utilize microscopic interferometry
标准状态
发布于：2026-08-28
实施于：2027-03-01
废止
基本信息
GB/T 48095-2026
即将实施
2026-08-28
2027-03-01
Chinese Academy of Sciences
State Administration for Market Regulation and Standardization Administration of China
National Technical Committee 487 on Opto electronic Measurement of Standardization Administration of China (SAC/TC 487); National Technical Committee 336 on Micro electro mechanical Technology of Standardization Administration of China (SAC/TC 336)
Chinese Academy of Sciences
南京理工大学; 上海市计量测试技术研究院有限公司; 中国电子科技集团公司第十三研究所; 中国科学院苏州纳米技术与纳米仿生研究所; 苏州工业园区纳米产业技术研究院有限公司; 中国科学院微电子研究所; National Institute of Metrology, China; 中国科学院空天信息创新研究院; 齐之明光电智能科技(苏州)有限公司; 南京智群光电技术有限公司; 苏州热工研究院有限公司; 浙江大学苏州工业技术研究院; 无锡华润上华科技有限公司
GAO Zhishan, YUAN Qun, MA Jianqiu, HUO Xiao, LEI Lihua, ZHAO Lin, HE Hongtao, XU Aidong, SHI Wenhua, JU Tao, SHI Yuntao, ZHOU Weihu, SHI Yushu, WANG Pu, GONG Yan, LI Ji, LUO Kunjie, XU Zhiyi, CHEN Hong and XIA Changfeng
标准简介
This document describes the measurement principle, measuring device, measurement environment, samples, measurement procedure, data processing and measurement report of the microscopic interferometry method for measuring the topographic parameters of high-aspect-ratio microstructures. This document is applicable to the inspection and measurement of the topographic parameters of high-aspect-ratio microstructures with an aspect ratio of not more than 50 in micro/nano devices that are transparent to visible or near-infrared light.
内容预览
