硅片参考面结晶学取向X射线测量方法
Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
标准状态
发布于：1992-02-19
实施于：1992-10-01
已废止
基本信息
内容预览
Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques